Atomic layer deposition (ALD, Atomic layer deposition) technology refers to the deposition of materials with single atoms. It uses the characteristics of saturated chemical adsorption to ensure high conformal uniform deposition on large-area, porous, tubular, powder or other complex-shaped substrates. It is a true "nano" technology. Compared with traditional deposition methods, ALD technology has the following characteristics:

(1) The deposition is self-limiting, and the thickness can be precisely controlled, reaching the order of Å;

(2) Films with uniform thickness can be attached uniformly along many irregular surfaces;

(3) The deposition temperature is low, which is suitable for the deposition of many substances with poor thermal stability (such as organic matter).

(4) Adjustability of the chemical, physical and mechanical properties of the deposited film

Based on the above advantages, the application of ALD technology in the energy field has gradually increased in recent years (ACS Energy Letters, 2018, 3, 899-914). The report focuses on the study of the characteristics of ALD control film uniformity and applies it to liquid and solid-state applications. Electrolyte batteries (especially the modification and control of the electrode/electrolyte interface) have overcome many problems in the field of secondary batteries, demonstrated huge application potential, and provided important reference and guidance for the future development of high-performance battery devices. The way forward.